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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">vestifm</journal-id><journal-title-group><journal-title xml:lang="ru">Известия Национальной академии наук Беларуси. Серия физико-математических наук</journal-title><trans-title-group xml:lang="en"><trans-title>Proceedings of the National Academy of Sciences of Belarus. Physics and Mathematics Series</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">1561-2430</issn><issn pub-type="epub">2524-2415</issn><publisher><publisher-name>The Republican Unitary Enterprise Publishing House "Belaruskaya Navuka"</publisher-name></publisher></journal-meta><article-meta><article-id custom-type="elpub" pub-id-type="custom">vestifm-76</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>ФИЗИКА</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>PHYSICS</subject></subj-group></article-categories><title-group><article-title>ИССЛЕДОВАНИЕ ВАКАНСИОННО-КИСЛОРОДНЫХ КОМПЛЕКСОВ В ОБЛУЧЕННЫХ БЫСТРЫМИ ЭЛЕКТРОНАМИ И НЕЙТРОНАМИ КРИСТАЛЛАХ КРЕМНИЯ МЕТОДОМ ИК-ПОГЛОЩЕНИЯ</article-title><trans-title-group xml:lang="en"><trans-title>IR ABSORPTION STADIES OF VACANCY-OXYGEN RELATED COMPLEXES IN FAST ELECTRON AND NETRON-IRRADIATED SILICON CRYSTALS</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Толкачева</surname><given-names>Е. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Tolkacheva</surname><given-names>E. A.</given-names></name></name-alternatives><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Мурин</surname><given-names>Л. И.</given-names></name><name name-style="western" xml:lang="en"><surname>Murin</surname><given-names>L. I.</given-names></name></name-alternatives><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Научно-практический центр Национальной академии наук Беларуси по материаловедению, Минск</institution></aff><aff xml:lang="en"><institution>Scientific-Practical Materials Research Centre of NAS of Belarus, Minsk</institution></aff></aff-alternatives><pub-date pub-type="collection"><year>2014</year></pub-date><pub-date pub-type="epub"><day>17</day><month>05</month><year>2016</year></pub-date><volume>0</volume><issue>2</issue><fpage>101</fpage><lpage>104</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Толкачева Е.А., Мурин Л.И., 2016</copyright-statement><copyright-year>2016</copyright-year><copyright-holder xml:lang="ru">Толкачева Е.А., Мурин Л.И.</copyright-holder><copyright-holder xml:lang="en">Tolkacheva E.A., Murin L.I.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://vestifm.belnauka.by/jour/article/view/76">https://vestifm.belnauka.by/jour/article/view/76</self-uri><abstract><p>Методом ИК-спектроскопии установлено, что в температурном интервале отжига дивакансий (200-275 °С) в облученных кислородосодержащих кристаллах кремния имеет место формирование двух полос поглощения, расположенных у 833,4 и 842,4 см-1. В отличие от предыдущих исследований, где обе эти полосы были приписаны комплексу дивакансия-кислород V2O, образующемуся путем захвата подвижных V2 междоузельными атомами кислорода 0;, только полоса у 833,4 см-1 может быть приписана данному дефекту. Относительная интенсивность полосы у 842,4 см-1 существенно увеличивается в образцах, облученных нейтронами, по сравнению с образцами, облученными электронами. Сделано заключение, что эта полоса связана с комплексом тривакансия-кислород V30, образующимся путем захвата подвижных V3атомами 0i atoms.</p></abstract><trans-abstract xml:lang="en"><p>By means of infrared absorption spectroscopy a clear correlation between the disappearance of the divacancy (V2 in the temperature range 200-275 °C and the appearance of two absorption bands positioned at 833.4 and 842.4 cm-1 in irradiated oxygen-rich Si crystals has been found. Both these two emerging bands have previously been assigned to a divacancy-oxygen defect V2O formed via interaction of mobile V2 with interstitial oxygen (Ot) atoms. The present study shows, however, that the two bands arise from different defects since the ratio of their intensities depends on the type of irradiation and only the band at 833.4 cm-1 can be assigned to V2O. The 842.4 cm-1 band is much more pronounced in neutron irradiated samples as compared to the samples irradiated with electrons. We argue that it is related to a trivacancy-oxygen defect (V3O) formed via interaction of mobile V3 with Oi atoms.</p></trans-abstract></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Londos C. A., Fytros L. G., Georgiou G. J. // Defect and Diffusion Forum. 1999. Vol. 273/274. P. 1-32.</mixed-citation><mixed-citation xml:lang="en">Londos C. A., Fytros L. G., Georgiou G. 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