vestifmИзвестия Национальной академии наук Беларуси. Серия физико-математических наукProceedings of the National Academy of Sciences of Belarus. Physics and Mathematics Series1561-24302524-2415The Republican Unitary Enterprise Publishing House "Belaruskaya Navuka"10.29235/1561-2430-2024-60-4-335-343vestifm-814Research ArticleФИЗИКАPHYSICSОптическая нанолитография на основе плазмонного резонансаOptical nanolithography based on plasmon resonancehttps://orcid.org/0000-0002-1866-4791КурилкинаС. Н.KurilkinaS. N.

Курилкина Светлана Николаевна – доктор физико-математических наук, профессор, главный научный сотрудник

пр. Независимости, 68-2, 220072, Минск

Svetlana N. Kurilkina – Dr. Sc. (Physics and Mathematics), Professor, Chief Researcher

68-2, Nezavisimosti Ave., 220072, Minsk

s.kurilkina@ifanbel.bas-net.byhttps://orcid.org/0000-0001-5550-1708ХилоН. А.KhiloN. A.

Хило Николай Анатольевич – кандидат физико-математических наук, доцент, ведущий научный сотрудник

пр. Независимости, 68-2, 220072, Минск

Nikolai A. Khilo – Ph. D. (Physics and Mathematics), Associate Professor, Leading Researcher

68-2, Nezavisimosti Ave., 220072, Minsk

n.khilo@dragon.bas-net.byИнститут физики имени Б. И. Степанова Национальной академии наук БеларусиB. I. Stepanov Institute of Physics of the National Academy of Sciences of Belarus202408012025604335343Copyright © Курилкина С.Н., Хило Н.А., 20252025Курилкина С.Н., Хило Н.А.Kurilkina S.N., Khilo N.A.Данная работа распространяется под лицензией Creative Commons Attribution 4.0.This work is licensed under a Creative Commons Attribution 4.0 License.https://vestifm.belnauka.by/jour/article/view/814

Предложена и исследована схема для оптической нанолитографии интерференционного типа, основанная на использовании возбуждения встречных поверхностных плазмон-поляритонов на плоской границе раздела металлодиэлектрической наноструктуры. Выполнен детальный расчет схемы оптической нанолитографии, предназначенной для формирования синусоидальных дифракционных решеток. Показано, что использование призмы ввода с большим показателем преломления позволяет более чем на порядок повысить коэффициент усиления формируемого в фоторезисте светового поля. Установлено, что путем изменения толщины слоев металлодиэлектрической структуры можно изменять волновое число, при котором реализуется условие плазмонного резонанса, и тем самым управлять периодом формируемых решеток и глубиной проникновения поля в фоторезист. Предложенная схема может быть использована для создания двумерных, круговых решеток, а также решеток произвольной формы при соответствующем выборе формы вводной призмы.

In this paper, we propose and investigate a scheme for optical nanolithography of the interference type based on the use of excitation of counter-propagating surface plasmon-polaritons at a flat interface of a metal-dielectric nanostructure. A detailed calculation of the optical nanolithography scheme designed to form sinusoidal diffraction gratings is performed. It is shown that the use of an input prism with a large refractive index allows increasing the gain of the light field formed in the photoresist by more than an order of magnitude. It is found, that by changing the thickness of the layers of the metal-dielectric structure it is possible to change the wave number at which the plasmon resonance condition is realized, and thereby to control the period of the formed gratings and the depth of field penetration into the photoresist. The proposed scheme may be used to create two-dimensional, circular gratings, as well as gratings of arbitrary shape with an appropriate choice of the shape of input prism.

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The authors declare that there are no conflicts of interest present.