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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">vestifm</journal-id><journal-title-group><journal-title xml:lang="ru">Известия Национальной академии наук Беларуси. Серия физико-математических наук</journal-title><trans-title-group xml:lang="en"><trans-title>Proceedings of the National Academy of Sciences of Belarus. Physics and Mathematics Series</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">1561-2430</issn><issn pub-type="epub">2524-2415</issn><publisher><publisher-name>The Republican Unitary Enterprise Publishing House "Belaruskaya Navuka"</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.29235/1561-2430-2025-61-2-128-138</article-id><article-id custom-type="elpub" pub-id-type="custom">vestifm-838</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>ФИЗИКА</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>PHYSICS</subject></subj-group></article-categories><title-group><article-title>Эллипсометрия подложки с наноразмерным поверхностным слоем</article-title><trans-title-group xml:lang="en"><trans-title>Ellipsometry of substrate with nanoscale surface layer</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Понкратов</surname><given-names>Д. В.</given-names></name><name name-style="western" xml:lang="en"><surname>Ponkratov</surname><given-names>D. V.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Понкратов Дмитрий Васильевич – аспирант</p><p>ул. Космонавтов, 1, 212022, Могилев</p></bio><bio xml:lang="en"><p>Dmitry V. Ponkratov – Postgraduate Student</p><p>1, Kosmonavtov Str., 212022, Mogilev</p></bio><email xlink:type="simple">d.v.ponkratov@yandex.by</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Сотский</surname><given-names>А. Б.</given-names></name><name name-style="western" xml:lang="en"><surname>Sotsky</surname><given-names>A. B.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Сотский Александр Борисович – доктор физико- математических наук, профессор, профессор кафедры физики и компьютерных технологий</p><p>ул. Космонавтов, 1, 212022, Могилев</p></bio><bio xml:lang="en"><p>Alexander B. Sotsky – Dr. Sc. (Physics and Mathematics), Professor, Professor of the Department of Physics and Computer Technologies</p><p>1, Kosmonavtov Str., 212022, Mogilev</p></bio><email xlink:type="simple">ab_sotsky@mail.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Стаськов</surname><given-names>Н. И.</given-names></name><name name-style="western" xml:lang="en"><surname>Staskov</surname><given-names>N. I.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Стаськов Николай Иванович – кандидат физико- математических наук, профессор кафедры физики и компьютерных технологий</p><p>ул. Космонавтов, 1, 212022, Могилев</p></bio><bio xml:lang="en"><p>Nikolay I. Staskov – Ph. D. (Physics and Mathematics), Professor of the Department of Physics and Computer Technologies</p><p>1, Kosmonavtov Str., 212022, Mogilev</p></bio><email xlink:type="simple">ni_staskov@mail.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Сергейчик</surname><given-names>А. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Siarheichyk</surname><given-names>H. A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Сергейчик Анна Александровна – ведущий инженер</p><p>ул. Казинца, 121a, 220108, Минск</p></bio><bio xml:lang="en"><p>Hanna A. Siarheichyk – Leading Engineer</p><p>121a, Kazintsa St., 220108, Minsk</p></bio><email xlink:type="simple">anna.omelchenko.13177@mail.ru</email><xref ref-type="aff" rid="aff-2"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Могилевский государственный университет имени А. А. Кулешова</institution><country>Беларусь</country></aff><aff xml:lang="en"><institution>Mogilev State A. Kuleshov University</institution><country>Belarus</country></aff></aff-alternatives><aff-alternatives id="aff-2"><aff xml:lang="ru"><institution>ГЦ «Белмикросистемы», ОАО «Интеграл»</institution><country>Беларусь</country></aff><aff xml:lang="en"><institution>State Center “Belmicroanalysis”, JSC “INTEGRAL”</institution><country>Belarus</country></aff></aff-alternatives><pub-date pub-type="collection"><year>2025</year></pub-date><pub-date pub-type="epub"><day>11</day><month>07</month><year>2025</year></pub-date><volume>61</volume><issue>2</issue><fpage>128</fpage><lpage>138</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Понкратов Д.В., Сотский А.Б., Стаськов Н.И., Сергейчик А.А., 2025</copyright-statement><copyright-year>2025</copyright-year><copyright-holder xml:lang="ru">Понкратов Д.В., Сотский А.Б., Стаськов Н.И., Сергейчик А.А.</copyright-holder><copyright-holder xml:lang="en">Ponkratov D.V., Sotsky A.B., Staskov N.I., Siarheichyk H.A.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://vestifm.belnauka.by/jour/article/view/838">https://vestifm.belnauka.by/jour/article/view/838</self-uri><abstract><p>Сформулировано аналитическое решение обратной задачи эллипсометрии об определении комплексной диэлектрической проницаемости подложки при наличии на ее поверхности наноразмерного слоя с неизвестными заранее характеристиками. Поверхностный слой учитывается одним интегральным параметром, восстанавливаемым одновременно с диэлектрической проницаемостью подложки. Решение использует эллипсометрические параметры Δ и Ψ, измеренные при двух углах падения света на структуру. Оптимальные значения углов падения устанавливаются из условия минимальности коэффициента ошибки восстановления диэлектрической проницаемости подложки. Эффективность решения проиллюстрирована в вычислительных и реальных экспериментах по эллипсометрии кремниевых подложек с различными поверхностными слоями. В частности, определена ширина запрещенной зоны кремниевой подложки, легированной бором и подвергнутой быстрой термической обработке для стабилизации поверхностного слоя.</p></abstract><trans-abstract xml:lang="en"><p>An analytical solution of the inverse ellipsometry problem on determining the complex permittivity of a substrate in the presence of a nanosized surface layer with previously unknown characteristics is formulated. The layer is taken into account only by one integral parameter, which is restored simultaneously with the substrate permittivity. The solution uses ellipsometric parameters Δ and Ψ, measured at two angles of light incidence on the structure. The optimal values of the incident angles are established from the condition of the minimum of the error coefficient of the substrate permittivity reconstruction. The efficiency of the solution is checked in numerical simulations and real experiments on the ellipsometry of silicon substrates with various surface layers. In particular, the band gap of a silicon substrate doped with boron and subjected to a rapid heat treatment to stabilize the surface layer is determined.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>обратная задача эллипсометрии</kwd><kwd>наноразмерный поверхностный слой</kwd><kwd>кремниевая подложка</kwd><kwd>оптимальные углы падения</kwd><kwd>ширина запрещенной зоны</kwd></kwd-group><kwd-group xml:lang="en"><kwd>inverse ellipsometry problem</kwd><kwd>nano-sized surface layer</kwd><kwd>silicon substrate</kwd><kwd>optimal angles of incidence</kwd><kwd>band gap</kwd></kwd-group><funding-group><funding-statement xml:lang="ru">Работа выполнена в рамках Го сударственной программы научных исследований «Фотоника и электроника для инноваций», подпрограмма «Фотоника и ее применение» (1.1. «Развитие физических основ и разработка методов волноводной спектроскопии тонкопленочных структур и сред»).</funding-statement><funding-statement xml:lang="en">This work was financially supported by the State Program of Scientific Research “Photonics and Electronics for Innovations”, subprogram “Photonics and its Applications” (1.1. “Advancement of Physical Principles and Development of Methods for Waveguide Spectroscopy of Thin-Film Structures and Media”).</funding-statement></funding-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">A model for spectroscopic ellipsometry analysis of plasma-activated Si surfaces for direct wafer bonding // N. Rauch, E. Andersen, I. G. Vicente-Gabás [et al.] // Applied Physics Letters. – 2022. – Vol. 121, № 8. – P.081603-1–081603-6. https://doi.org/10.1063/5.0101633</mixed-citation><mixed-citation xml:lang="en">Rauch N., Andersen E., Vicente-Gabás I. G., Duchoslav J., Minenkov A., Gasiorowski J., Flötgen C. [et al.]. A model for spectroscopic ellipsometry analysis of plasma-activated Si surfaces for direct wafer bonding. Applied Physics Letters, 2022, vol. 121, no. 8, pp. 081603-1–081603-6. https://doi.org/10.1063/5.0101633</mixed-citation></citation-alternatives></ref><ref id="cit2"><label>2</label><citation-alternatives><mixed-citation xml:lang="ru">Сотский, А. Б. Соотношение взаимности для интерференционных покрытий / А. Б. Сотский, Е. А. Чудаков // Весці Нацыянальнай акадэміі навук Беларусі. Серыя фізіка-матэматычных навук. – 2022. – Т. 59, № 2. – С. 158–167. https://doi.org/10.29235/1561-2430-2023-59-2-158-167</mixed-citation><mixed-citation xml:lang="en">Sotsky A. B., Chudakov E. A. Reciprocity relations for interference coatings. Vestsі Natsyyanalʼnaiakademіі navuk Belarusі. Seryya fіzіka-matematychnykh navuk = Proceedings of the National Academy of Sciences of Belarus. Physics and Mathematics series, 2023, vol. 59, no. 2, pp. 158–167 (in Russian). https://doi.org/10.29235/1561-2430-2023-59-2-158-167</mixed-citation></citation-alternatives></ref><ref id="cit3"><label>3</label><citation-alternatives><mixed-citation xml:lang="ru">Сотский, А. Б. Аномальный скин-эффект в металлических пленках / А. Б. Сотский, Е. А. Чудаков, Л. И. Сотская // Журнал прикладной спектроскопии. – 2024. – Т. 91, № 2. – С. 581–593.</mixed-citation><mixed-citation xml:lang="en">Sotsky A. B., Chudakov E. A., Sotskaya L. I. The anomalous skin effect in metallic films. Journal of Applied Spectroscopy, 2024, vol. 91, no. 4, pp. 812–825. https://doi.org/10.1007/s10812-024-01789-7</mixed-citation></citation-alternatives></ref><ref id="cit4"><label>4</label><citation-alternatives><mixed-citation xml:lang="ru">Handbook of Ellipsometry / eds.: H. G. Tompkins, E. A. Irene. – New York: William Andrew, Inc., 2005. – 891 p. https://doi.org/10.1007/3-540-27488-x</mixed-citation><mixed-citation xml:lang="en">Tompkins H. G., Irene E. A. (eds.). Handbook of Ellipsometry. New York, William Andrew, Inc., 2005. 891 p. https:// doi.org/10.1007/3-540-27488-x</mixed-citation></citation-alternatives></ref><ref id="cit5"><label>5</label><citation-alternatives><mixed-citation xml:lang="ru">Hiroyuki Fujiwara. Spectroscopic Ellipsometry: Principles and Applications / Hiroyuki Fujiwara. – John Wiley &amp; Sons, 2007. – 388 p. https://doi.org/10.1002/9780470060193</mixed-citation><mixed-citation xml:lang="en">Hiroyuki Fujiwara. Spectroscopic Ellipsometry: Principles and Applications. John Wiley &amp; Sons, 2007, 388 p. https:// doi.org/10.1002/9780470060193</mixed-citation></citation-alternatives></ref><ref id="cit6"><label>6</label><citation-alternatives><mixed-citation xml:lang="ru">Aspnes, D. E. Dielectric functions and optical parameters of Si, Ge, GaP, GaAs, GaSb, InP, InAs, and InSb from 1.5 to 6.0 eV / D. E. Aspnes, A. A. Studna // Physical Review B. – 1983. – Vol. 27, № 2. – С. 985–1009. https://doi.org/10.1103/physrevb.27.985</mixed-citation><mixed-citation xml:lang="en">Aspnes D. E., Studna A. A. Dielectric functions and optical parameters of Si, Ge, GaP, GaAs, GaSb, InP, InAs, and InSb from 1.5 to 6.0 eV. Physical Review B, 1983, vol. 27, no. 2, pp. 985–1009. https://doi.org/10.1103/physrevb.27.985</mixed-citation></citation-alternatives></ref><ref id="cit7"><label>7</label><citation-alternatives><mixed-citation xml:lang="ru">Jellison, G. E. Spectroscopic ellipsometry data analysis: measured versus calculated quantities / G. E. Jellison // Thin Solid Films. – 1998. – Vol. 313–314. – P. 33–39. https://doi.org/10.1016/s0040-6090(97)00765-7</mixed-citation><mixed-citation xml:lang="en">Jellison, G. E. Spectroscopic ellipsometry data analysis: measured versus calculated quantities. Thin Solid Films, 1998, vol. 313–314, pp. 33–39. https://doi.org/10.1016/s0040-6090(97)00765-7</mixed-citation></citation-alternatives></ref><ref id="cit8"><label>8</label><citation-alternatives><mixed-citation xml:lang="ru">Оптические характеристики естественного поверхностного слоя на кремниевой подложке // Н. И. Стаськов, А. Б. Сотский, Л. И. Сотская [и др.] // Известия Гомельского государственного университета имени Ф. Скорины. – 2006. – № 6–2 (39). – С. 60–62.</mixed-citation><mixed-citation xml:lang="en">Stas’kov N. I., Sotskij A. B., Sotskaya L. I., Ivashkevich I. V., Krekoten’ N. A., Bujko L. D. Optical characteristics of a natural surface layer on a silicon substrate. Izvestiya Gomel’skogo gosudarstvennogo universiteta imeni F. Skoriny = Proceedings Francisk Skorina Gomel State University, 2006, no. 6 (39), pp. 60–62 (in Russian).</mixed-citation></citation-alternatives></ref><ref id="cit9"><label>9</label><citation-alternatives><mixed-citation xml:lang="ru">Стаськов, Н. И. Трехкомпонентная модель эффективной среды для определения состава слоев на кремниевых пластинах / Н. И. Стаськов, Л. И. Сотская // Журнал прикладной спектроскопии. – 2017. – Т. 84, №5. – С. 703–709.</mixed-citation><mixed-citation xml:lang="en">Staskov N. I., Sotskaya L. I. Three-Component Model of an Effective Medium for Determining the Composition of Layers on Silicon Wafers. Journal of Applied Spectroscopy, 2017, vol. 84, no. 5, pp. 764–769. https://doi.org/10.1007/s10812017-0542-z</mixed-citation></citation-alternatives></ref><ref id="cit10"><label>10</label><citation-alternatives><mixed-citation xml:lang="ru">Сотский, А. Б. Теория оптических волноводных элементов: монография / А. Б. Сотский. – Могилев: МГУ им. А. А. Кулешова, 2011. – 455 с.</mixed-citation><mixed-citation xml:lang="en">Sotskij A. B. Theory of Optical Waveguide Elements. Mogilev, Mogilev State A. Kuleshov University, 2011. 455 p. (in Russian).</mixed-citation></citation-alternatives></ref><ref id="cit11"><label>11</label><citation-alternatives><mixed-citation xml:lang="ru">Найфэ, А. Введение в методы возмущений: пер. с англ. / А. Найфе. – М.: Мир, 1984. – 535 с.</mixed-citation><mixed-citation xml:lang="en">Nayfeh Ali H. Introduction to Perturbation Techniques. Wiley-VCH, 1993. 536 p.</mixed-citation></citation-alternatives></ref><ref id="cit12"><label>12</label><citation-alternatives><mixed-citation xml:lang="ru">О выборе диапазонов измерения отражательной способности призмы связи при волноводной спектроскопии тонких пленок / А. Б. Сотский, Л. М. Штейнгарт, С. О. Парашков [и др.] // Известия РАН. Серия физическая. – 2016. – Т. 80, № 4. – С. 465–469.</mixed-citation><mixed-citation xml:lang="en">Sotsky A. B., Steingart L. M., Parashkov S. O., Sotskaya L. I. Choosing the ranges for measuring the reflectivity of a prism coupler in the waveguide spectroscopy of thin films. Izvestiya RAN. Seriya fizicheskaya = Bulletin of the Russian Academy of Sciences: Physics, 2016, vol. 80, no. 4, pp. 465–469 (in Russian). https://doi.org/10.7868/s036767651604030x</mixed-citation></citation-alternatives></ref><ref id="cit13"><label>13</label><citation-alternatives><mixed-citation xml:lang="ru">Адамс, М. Введение в теорию оптических волноводов: пер. с англ. / М. Адамс. – М.: Мир, 1984. – 512 с.</mixed-citation><mixed-citation xml:lang="en">Adams M. J. An Introduction to Optical Waveguide. John Wiley &amp; Sons Inc, 1981. 401 p.</mixed-citation></citation-alternatives></ref><ref id="cit14"><label>14</label><citation-alternatives><mixed-citation xml:lang="ru">Palik, E. D. Handbook of Optical Constants of Solids / E. D. Palik. – Orlando: Academic Рress, 1985. – 1086 p. https://doi.org/10.1016/b978-0-08-054721-3.50005-8</mixed-citation><mixed-citation xml:lang="en">Palik E. D. Handbook of Optical Constants of Solids. Orlando, Academic Press., 1985. 1086 p. https://doi.org/10.1016/b978-0-08-054721-3.50005-8</mixed-citation></citation-alternatives></ref><ref id="cit15"><label>15</label><citation-alternatives><mixed-citation xml:lang="ru">Изменение оптических параметров кремния после быстрой термической обработки / В. М. Анищик, В. А. Горушко, В. А. Пилипенко [и др.] // Журнал Белорусского государственного университета. Физика. – 2021. – № 3. – С. 81–85. https://doi.org/10.33581/2520-2243-2021-3-81-85</mixed-citation><mixed-citation xml:lang="en">Anishchik V. M., Harushka V. A., Pilipenka U. A., Ponariadov V. V., Saladukha V. A., Omelchenko A. A. Variation of the silicon optical parameters after rapid heat treatment. Zhurnal Belorusskogo gosudarstvennogo universiteta. Fizika = Journal of the Belarusian State University. Physics, 2021, no. 3, pp. 81–85 (in Russian). https://doi.org/10.33581/2520-22432021-3-81-85</mixed-citation></citation-alternatives></ref><ref id="cit16"><label>16</label><citation-alternatives><mixed-citation xml:lang="ru">Определение зонной структуры и проводимости нанокомпозита Si@O@Al / А. С. Рудый, А. Б. Чурилов, С. В. Курбатов [и др.] // Журнал технической физики. – 2023. – Т. 93, вып. 10. – С. 1447–1458.</mixed-citation><mixed-citation xml:lang="en">Rudy A. S., Churilov A. B., Kurbatov S. V., Mironrenko A. A., Naumov V. V., Kozlov E. A. Determination of the band structure and conductivity of a nanocomposite Si@O@Al. Technical Physics, 2024, vol. 69, pp. 1753–1764. https://doi.org/10.1134/s1063784224060379</mixed-citation></citation-alternatives></ref><ref id="cit17"><label>17</label><citation-alternatives><mixed-citation xml:lang="ru">Fundamental Optical Properties of Materials I / W. C. Tan, K. Koughia, J. Singh, S. O. Kasap // Optical Properties of Condensed Matter and Applications / ed. J. Singh. – John Wiley &amp; Sons, Ltd, 2006. – P. 1–25. https://doi.org/10.1002/0470021942.ch1</mixed-citation><mixed-citation xml:lang="en">Tan W. C., Koughia K., Singh J., Kasap S. O. Fundamental Optical Properties of Materials I. Optical Properties of Condensed Matter and Applications. John Wiley &amp; Sons, Ltd, 2006. 25 p.</mixed-citation></citation-alternatives></ref><ref id="cit18"><label>18</label><citation-alternatives><mixed-citation xml:lang="ru">Kocevski, V. Transition between direct and indirect band gap in silicon nanocrystals / V. Kocevski, O. Eriksson, J. Rusz // Physical Review B. – 2013. – Vol. 87. – P. 245401-1–245401-9. https://doi.org/10.1103/physrevb.87.245401</mixed-citation><mixed-citation xml:lang="en">Kocevski V., Eriksson O., Rusz J. Transition between direct and indirect band gap in silicon nanocrystals. Physical Review B, 2013, vol. 87, pр. 245401-1–245401-9. https://doi.org/10.1103/PhysRevB.87.245401</mixed-citation></citation-alternatives></ref></ref-list><fn-group><fn fn-type="conflict"><p>The authors declare that there are no conflicts of interest present.</p></fn></fn-group></back></article>
