Optical nanolithography based on plasmon resonance
https://doi.org/10.29235/1561-2430-2024-60-4-335-343
Abstract
In this paper, we propose and investigate a scheme for optical nanolithography of the interference type based on the use of excitation of counter-propagating surface plasmon-polaritons at a flat interface of a metal-dielectric nanostructure. A detailed calculation of the optical nanolithography scheme designed to form sinusoidal diffraction gratings is performed. It is shown that the use of an input prism with a large refractive index allows increasing the gain of the light field formed in the photoresist by more than an order of magnitude. It is found, that by changing the thickness of the layers of the metal-dielectric structure it is possible to change the wave number at which the plasmon resonance condition is realized, and thereby to control the period of the formed gratings and the depth of field penetration into the photoresist. The proposed scheme may be used to create two-dimensional, circular gratings, as well as gratings of arbitrary shape with an appropriate choice of the shape of input prism.
About the Authors
S. N. Kurilkina
B. I. Stepanov Institute of Physics of the National Academy of Sciences of Belarus
Belarus
Belarus
Svetlana N. Kurilkina – Dr. Sc. (Physics and Mathematics), Professor, Chief Researcher
68-2, Nezavisimosti Ave., 220072, Minsk
N. A. Khilo
B. I. Stepanov Institute of Physics of the National Academy of Sciences of Belarus
Belarus
Belarus
Nikolai A. Khilo – Ph. D. (Physics and Mathematics), Associate Professor, Leading Researcher
68-2, Nezavisimosti Ave., 220072, Minsk
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