SURFACE EROSION OF MULTILAYER FILMS BASED ON ZIRCONIUM AND SILICON NITRIDES IRRADIATED WITH HELIUM IONS

V. V. Uglov

doi:10.29235/1561-2430-2018-54-1-110-118

SURFACE EROSION OF MULTILAYER FILMS BASED ON ZIRCONIUM AND SILICON NITRIDES IRRADIATED WITH HELIUM IONS

V. V. Uglov

https://doi.org/10.29235/1561-2430-2018-54-1-110-118

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Abstract

The article is devoted to the investigation of surface erosion of ZrN/SiN_x multilayer films irradiated with He ions (30 keV) and annealed in vacuum at 600 °C. It was found that multilayer ZrN/SiN_x films remain resistant to blistering and flacking when irradiated with He ions (30 keV) up to a dose of 8∙10¹⁶ cm^–2. The influence of the thickness of the crystalline and amorphous layer on the surface erosion nature and degree of multilayer films as a result of post-radiation annealing at 600 °C are revealed. The possible mechanisms of blistering and flexing in multilayer systems ZrN/SiN_x are discussed in the work.

Keywords

blister formation, flexing, multilayer films, ion irradiation

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Proceedings of the National Academy of Sciences of Belarus. Physics and Mathematics Series

SURFACE EROSION OF MULTILAYER FILMS BASED ON ZIRCONIUM AND SILICON NITRIDES IRRADIATED WITH HELIUM IONS

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Proceedings of the National Academy of Sciences of Belarus. Physics and Mathematics Series

SURFACE EROSION OF MULTILAYER FILMS BASED ON ZIRCONIUM AND SILICON NITRIDES IRRADIATED WITH HELIUM IONS

Full Text:

Abstract

Keywords

About the Author

References

Review

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